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![]() Principle: Ion beam etch is to decompose gas into ions through ion source by glow discharge principle under vacuum condition, and ions are physically bombarded on sample surface by electric field acceleration to achieve etch effect. When directed high-energy ions strike solid targets, energy is transferred from incident ions to solid surface atoms. If the binding energy between solid surface atoms is lower than the incident ion energy, the solid surface atoms will be removed or removed from the surface. Usually the ions used for ion beam etch come from inert gases. |
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