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Load-Lock:

Multi-chip automatic Load-Lock chamber, optional

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Pumping system:

Crypump/Magnetic suspension molecular pump + Dry pump

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Vacuum gauge:

Full range vacuum gauge + Capacitive diaphragm vacuum gauge

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Flow control:

Mass flow controller

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Sputter power supply:

DC/RF/Pulse DC, can be switched freely

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Bias:

RF/Pulse DC

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Ion source:

RF & Kaufman & Hall ion source, optional

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Number of cathodes:

Up to 4

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Ultimate vacuum:

1E-5Pa

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Uniform deposition area:

5*?300mm

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Coating uniformity:

±1.5%

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Coating repeatability:

±2%

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Space requirements:

4.35m（Length）*4.42m（Width）*2.85m（Height）